首页> 外国专利> Vertical transistor on supporting contact layer - grown epitaxially on reverse of substrate with diffused base and emitter zones

Vertical transistor on supporting contact layer - grown epitaxially on reverse of substrate with diffused base and emitter zones

机译:支撑接触层上的垂直晶体管-外延生长在具有反向基极和发射极区域的基板背面

摘要

A transistor consists of an n-type first zone of an n plus-or-minus type support and contact layer. A p-type zone in the former acts as the base zone, and an n plus-or-minus zone inside this zone acts as the emitter. The first zone itself is used as the collector of the transistor. Specifically, the n plus-or-minus type is grown epitaxially on the n-type first zone which acts as the substrate. A third zone of the p-type encloses an n plus-or-minus type fourth zone; both pn-junctions terminate at the main surface. The support zone can thus be grown epitaxially with a perfect monocrystalline structure on the first zone which serves as the substrate.
机译:晶体管由n个正负型支撑和接触层的n个第一区组成。前者中的p型区域用作基极区域,该区域内的n个正负区域用作发射极。第一个区域本身用作晶体管的集电极。具体地,在作为衬底的n型第一区域上外延生长n正负型。 p型的第三个区域包围n个正负型的第四区域;两个pn结都终止于主表面。因此,支撑区域可以在用作衬底的第一区域上以完美的单晶结构外延生长。

著录项

  • 公开/公告号DE2612460A1

    专利类型

  • 公开/公告日1977-10-13

    原文格式PDF

  • 申请/专利权人 ROBERT BOSCH GMBH;

    申请/专利号DE19762612460

  • 发明设计人 VITSWALTERDR.;EGELHAAFPETERDIPL.-PHYS.DR.;

    申请日1976-03-24

  • 分类号H01L21/18;H01L29/06;

  • 国家 DE

  • 入库时间 2022-08-23 00:01:48

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