首页> 外国专利> Microfilm analyser using fixed source as analysis beam - has screen forming secondary source and step displacement system

Microfilm analyser using fixed source as analysis beam - has screen forming secondary source and step displacement system

机译:使用固定源作为分析光束的缩微胶片分析仪-具有屏幕形成辅助源和阶梯位移系统

摘要

A first optical system deviates the analysis beam along a line of known length. The point of impact of the analysis beam on a screen constitutes a secondary source which can move along this line. A second optical system assures the transposition and reduction of the line scanned by the secondary source onto a line of the microfilm. A step-by-step displacement system moves the first optical system perpendicular to the line scanned by the secondary source and a photoelectric detector converts the light transmitted by the microfilm into electrical signals.
机译:第一光学系统沿着已知长度的线偏离分析光束。分析光束在屏幕上的冲击点构成了可以沿此线移动的辅助源。第二光学系统确保由次级源扫描的线在缩微胶片的线上移位和缩小。逐步位移系统使第一光学系统垂直于次级光源扫描的线移动,光电探测器将微缩胶片传输的光转换为电信号。

著录项

  • 公开/公告号FR2281581B1

    专利类型

  • 公开/公告日1977-03-18

    原文格式PDF

  • 申请/专利权人 CIT ALCATEL;

    申请/专利号FR19740027731

  • 发明设计人

    申请日1974-08-09

  • 分类号G02B27/17;

  • 国家 FR

  • 入库时间 2022-08-22 23:51:27

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