首页> 外国专利> PROCEDURE FOR THE USE OF INTERFEROMETRIC INFORMATION FROM TWO DIFFERENT HOLOGRAMS EXPOSED IN A SHORT-TERM RELATIONSHIP

PROCEDURE FOR THE USE OF INTERFEROMETRIC INFORMATION FROM TWO DIFFERENT HOLOGRAMS EXPOSED IN A SHORT-TERM RELATIONSHIP

机译:短期关系中公开的两个不同全息图使用干涉仪信息的程序

摘要

The present invention is directed to a holographic interferometer for measuring the deformation of an object or mechanical structure by exposing one or more hologram plates to a light source and a reference beam. In particular, the invention is directed to a method and apparatus for moving the hologram plate during and between exposures to thereby obtain exposures on different portions of the hologram plate. Each of these different exposures is taken in a short time interval in response to light reflected by the object from the light source as well as light from the reference beam. The image on the hologram plates is then reconstructed in a manner generally known in the art to determine the deformation of the object or mechanical structure. In order to obtain these exposures on different portions of the hologram plates, a screen having one or more apertures is positioned in front of the hologram plates to restrict the size of the short time interval exposures on the hologram plates. The hologram plates are continuously rotated prior to and during the exposures about an axis of rotation which is located perpendicularly to the surface of the hologram plates and is positioned so that some portion of the hologram plates is always located behind the aperture in the screen. In order to obtain a suitable direction of the interference lines, the reference beam, the aperture in the screen, the object and the axis of rotation of the hologram plates are positioned in the same plane. In the preferred embodiment, two different hologram plates are rotated together behind the screen. During reconstruction, these different hologram plates are positioned adjacent one another so that the surfaces of the forward hologram plate exposed by the first exposure pulse cover the surfaces of the rearward hologram plate exposed by the second exposure pulse, or vice versa. As a result, the interference lines in the hologram image correspond to the object or mechanical structure which is being measured for deformation.
机译:本发明涉及一种全息干涉仪,该全息干涉仪通过将一个或多个全息图板暴露于光源和参考光束来测量物体或机械结构的变形。特别地,本发明针对一种用于在曝光期间和之间移动全息图板从而在全息图板的不同部分上获得曝光的方法和设备。响应于对象从光源反射的光以及参考光束的光,在较短的时间间隔内拍摄这些不同的曝光中的每一个。然后以本领域中通常已知的方式重建全息图板上的图像,以确定物体或机械结构的变形。为了在全息图板的不同部分上获得这些曝光,将具有一个或多个孔的屏幕放置在全息图板的前面以限制全息图板上的短时间间隔曝光的尺寸。全息图板在曝光之前和曝光期间围绕旋转轴连续旋转,该旋转轴垂直于全息图板的表面定位并且被定位成使得全息图板的某些部分总是位于屏幕的孔的后面。为了获得干涉线的合适方向,参考光束,屏幕上的孔,物体和全息图板的旋转轴位于同一平面上。在优选实施例中,两个不同的全息图板在屏幕后面一起旋转。在重建期间,这些不同的全息图板彼此相邻放置,以使得由第一曝光脉冲曝光的前向全息图板的表面覆盖由第二曝光脉冲曝光的向后全息图板的表面,反之亦然。结果,全息图图像中的干涉线对应于被测量变形的物体或机械结构。

著录项

  • 公开/公告号SE7701188L

    专利类型

  • 公开/公告日1978-08-04

    原文格式PDF

  • 申请/专利权人 ABRAMSON NILS HUGO LEOPOLD;

    申请/专利号SE19770001188

  • 发明设计人 SOK;

    申请日1977-02-03

  • 分类号G03H1/04;

  • 国家 SE

  • 入库时间 2022-08-22 22:37:34

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