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Solder layer for a semi-conductor device consisting of at least one group V element, at least one rare element and aluminum

机译:用于半导体装置的焊料层,其由至少一种V族元素,至少一种稀有元素和铝组成

摘要

A semi-conductor device comprising a silicon body having an exposed surface of N-type conductivity layer and a substrate bonded to the exposed surface by means of a layer of a new solder material, the solder material being an alloy consisting essentially of 2 to 12% by weight of at least one element of Group V of the periodic table, preferably antimony, and 0.01 to 5% by weight of at least one of rare earth elements, for example, Misch metal and aluminum being balance on the basis of total weight of the solder material. An increase in FVD of the device in which a conventional aluminum solder is used is prevented by the use of the new solder materials.
机译:一种半导体器件,包括具有N型导电层的暴露表面的硅体和通过一层新的焊料材料粘结到该暴露表面的衬底,该焊料材料是基本上由2至12的合金组成元素周期表中第V族的至少一种元素的重量百分比,优选为锑,和至少一种稀土元素的重量百分比为0.01%至5%,例如Misch金属和铝以总重量为基准焊料材料。通过使用新的焊料材料,可以防止使用传统铝焊料的设备的FVD增大。

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