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Polycrystalline silicon etching with tetramethylammonium hydroxide
Polycrystalline silicon etching with tetramethylammonium hydroxide
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机译:用氢氧化四甲铵蚀刻多晶硅
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摘要
A family of etchants for polycrystalline silicon based upon an aqueous solution of NR.sub.4 OH, where R is an alkyl group, has a relatively low etching rate enabling the exercise of better control over the delineation of fine structures.
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