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Device semi - driver has the effect of the field of the type a grid isolee, using this device and method of manufacturing the latter

机译:使用该设备及其制造方法,设备半驱动器具有网格隔离的类型的场效应

摘要

P device semi - driver of the type igfet. / p & & p & this device comprises a substrate semiconductor - driver of a first type of conductivity, which comprises a main surface, a pair of semi - conductive regions of the first and second regions semi - conductors of a second type of conductivity opposite to the first formed in the substrate and extending as far as its main surface, a third region, a semi conducting - of the second type of conductivity which is adjacent to the second region, this third region is also formed in the substrate and also extending as far as its main surface and this so as to surround the second region, the said third region having a concentration of impurities of less than those of the first and second regions, a fourth semi - conductive region of the second type of conductivity which is adjacent to the third region and is formed partially in said main surface between the third and the first region, the fourth region having a concentration of impurities still lower than that of the third region and a thickness less than those of the first and second regions, an insulating film formed on the main surface, of the substrate surface extending between the fourth and the first region and a gate formed on the insulating film so as to cover the surface of the substrate between the fourth and the first regions. / p & & p & particular application to the amplifiers. / p
机译:

设备半-igfet类型的驱动程序。 & &该器件包括衬底半导体-第一导电类型的驱动器,该驱动器包括主表面,第一区域和第二区域的一对半导电区域以及与第二导电类型相反的第二类型导电性的半导电区域。衬底并延伸至其主表面,该第三区域是与第二区域相邻的第二类型导电性的半导电区域,该第三区域也形成在衬底中,并且延伸至其主表面所述第三区域的杂质浓度小于所述第一区域和第二区域的杂质浓度,所述第二区域具有与所述第三区域相邻的第二导电类型的第四半导体区域,并且在所述第三和第一区域之间的所述主表面中部分地形成有杂质,所述第四区域的杂质浓度仍低于所述第三区域的杂质浓度,并且厚度e与第一区域和第二区域相比,在第四区域和第一区域之间延伸的基板表面的主表面上形成有绝缘膜,并且在绝缘膜上形成的栅极覆盖绝缘膜之间的栅极。第四和第一区域。 & &放大器的特殊应用。

著录项

  • 公开/公告号FR2400259A1

    专利类型

  • 公开/公告日1979-03-09

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;HITACHI LTD;

    申请/专利号FR19780032897

  • 发明设计人

    申请日1978-11-22

  • 分类号H01L29/78;

  • 国家 FR

  • 入库时间 2022-08-22 19:33:47

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