Observation apparatus in the application polarized of the images of a mask and of a plate for the manufacture of semi-finished - conductors

摘要

P the invention relates to a device for observation in application polarized. / p & & p & it relates to a device for observation of the fact that a mask m of the formation of a component a semi - conductor and a wafer w are aligned in position determined. The apparatus eliminated the application reflected by the mask by the use of a mirror phase shift and an optical analyser, allowing the observation of the cover and the plate without any difference of luminosities. / p & & p & application for the manufacture of the circuits a semi -. & / p