ELECTRON BEAM PLATE MAKING METHOD BY VAPOR PHASE FILM FORMATION AND VAPOR PHASE DEVELOPMENT

摘要

PURPOSE:To make a plate making process continuous and clean and enhance the reliability of plate making by forming a resist film on the surface of a substrate in vapor phase in a vacuum container and developing the film in vapor phase after exposure. CONSTITUTION:A substrate is set in a discharge vacuum container, and after filling the container with an inert gas such as argon of about 0.5-1 Torr discharge is induced. A monomer such as methyl acrylate is introduced into the container and polymerized on the substrate to form an about 0.2-1.5mu thick resist film. This film is irradiated with electron beams in the form of a desired pattern, and the irradiated portion of the polymer is decomposed. The container is then filled with a corrosive gas such as CCl, of 10-2-10-3 Torr, discharge is induced, and the film is developed by plasma etching to make a plate.