DRY DEVELOPER PARTICLE OF RESISTIVITY HIGHER THAN 10 SU14 XX OHM-CM COMPRISING THERMOPLASTIC RESIN AND MAGNETIC MATERIAL

摘要

Abstract of the DisclosureA dry developer particle for use in electrophotographyincluding thermoplastic synthetic resin and magnetic materials tohave an electric resistance higher than 1014 .OMEGA.cm to possess mag-netically attractive and electrically insulating properties.There is further provided a method for developing an electrostaticcharge image on a photosensitive element by such developer parti-cles under the action of electric and electrostatic forces gener-ated therebetween.