首页> 外国专利> Thiophosphoric acid and thiophosphonic acid halide prodn. - by reacting phosphoric or phosphonic acid halide with phosphorus tri:chloride and sulphur

Thiophosphoric acid and thiophosphonic acid halide prodn. - by reacting phosphoric or phosphonic acid halide with phosphorus tri:chloride and sulphur

机译:硫代磷酸和硫代膦酰卤产品。 -通过使磷酸或膦酰卤与三氯化磷和硫反应

摘要

In the prodn. of thiophosphoric and thiophosphonic acid halides of formula R-P(=S)XR1 (I) (where R is 1-20C alkyl, 2-20C alkenyl, 7-12C aralkyl or 6-10C aryl, opt. mono-, di- or trisubstd, by Cl, Br, 1-4C alkyl or 1-4C alkoxy; X is halogen1 and R1 is R or X) by reacting a halide of formula R. P(=O)XR1 (II) with PSCl3 at 140-250 (150-200) degrees C at approximately atmospheric pressure, with continuous removal of resulting POCl3 by distn., (a) PCl3 and sulphur are used instead of PSCl3; (b) the reaction is carried out at moderately elevated pressure; and (c) the continuous removal of POCl3 by distn. is opt. omitted. (I) are intermediates for plant protection agents, selective extraction agents and lubricant additives. Process avoids use of PSCl3, and gives shortened reaction times.
机译:在产品中式RP(= S)XR1(I)的硫代磷酸和硫代膦酰卤的化合物(其中R为1-20C烷基,2-20C烯基,7-12C芳烷基或6-10C芳基,优选单,二或三取代) P(= O)XR1(II)与PSCl3在140-250的温度下(Cl,Br,1-4C烷基或1-4C烷氧基; X为卤素1且R1为R或X)。在大约大气压下于150-200°C的温度下连续分离除去所得的POCl3。(a)使用PCl3和硫代替PSCl3; (b)反应在中等压力下进行; (c)按距离连续除去POCl 3。是选择的。省略。 (I)是植物保护剂,选择性萃取剂和润滑剂添加剂的中间体。该方法避免使用PSCl3,并缩短了反应时间。

著录项

  • 公开/公告号DE2820607A1

    专利类型

  • 公开/公告日1979-11-15

    原文格式PDF

  • 申请/专利权人 HOECHST AG;

    申请/专利号DE19782820607

  • 发明设计人 STAEHLERGERHARDDR.;

    申请日1978-05-11

  • 分类号C07F9/42;C07F9/34;

  • 国家 DE

  • 入库时间 2022-08-22 17:37:28

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号