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MANUFACTURE OF INDEFINITE FORM SILICON SPUTTERED TO ADJUSTED MONOHYDROGENATED AND POLYHYDROGENATED BOND DENSITY
MANUFACTURE OF INDEFINITE FORM SILICON SPUTTERED TO ADJUSTED MONOHYDROGENATED AND POLYHYDROGENATED BOND DENSITY
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机译:调整单价氢化和多氢化键合密度的不确定形态硅的制造
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摘要
A reactively sputtered photoconductive amorphous silicon film having a controlled monohydride and polyhydride bond density is produced by applying a voltage bias to the film's substrate (14) during reactively sputtering a layer of amorphous silicon in a partial pressure of hydrogen.
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