首页> 外国专利> Tri:organo-mono:chloro-silane cpds. prodn. - by reacting hexa:organo-di:siloxane cpds. with hydrogen chloride under pressure, useful for silicone prodn.

Tri:organo-mono:chloro-silane cpds. prodn. - by reacting hexa:organo-di:siloxane cpds. with hydrogen chloride under pressure, useful for silicone prodn.

机译:三:有机单:氯硅烷cpds。产品-通过使六:有机二:硅氧烷cpds反应。在压力下用氯化氢处理,可用于有机硅产品。

摘要

Prodn. of triorgano-monochloro-silanes (I) of the formula R3SiCl by reacting hexaorganodisiloxanes (II) of the formula (R3Si)20 (in which the R gps. independently are opt. substd. 1-12C hydrocarbyl gps.) with HCl is carried out at elevated HCl pressure. Pref. (II) is hexamethyldisiloxane (IIA). Pref. the HCl pressure is 1.1-40 bar and the reaction temp. -15 to +20 deg.C. Quantitative reaction takes place without addn. of dehydrating salts (I) are useful starting materials for silicones. In an example, a 4 l autoclave was charged at room temp. with 1000 g (IIA) and HCl to a pressure kept at 15 bar for 3 hr. The lower phase consisted of concn. HCl, whilst the upper phase contained 99.4% Me3SiCl.
机译:产品通过使式(R3Si)20的六有机二硅氧烷(II)(其中R gps独立地为优选地小于1-12C的烃基gps)与HCl反应来制备式R3SiCl的三有机一氯硅烷(I)在升高的HCl压力下蒸发。首选(II)是六甲基二硅氧烷(IIA)。首选HCl压力为1.1-40 bar,反应温度为-15至+20摄氏度定量反应没有加成发生。脱水盐(I)是有机硅的有用起始原料。在一个例子中,在室温下装入4升高压釜。用1000g(IIA)和HCl将其保持在15巴的压力下3小时。下相由concn组成。 HCl,而上层相包含99.4%Me3SiCl。

著录项

  • 公开/公告号DE3013920A1

    专利类型

  • 公开/公告日1981-10-15

    原文格式PDF

  • 申请/专利权人 BAYER AG;

    申请/专利号DE19803013920

  • 申请日1980-04-11

  • 分类号C07F7/12;

  • 国家 DE

  • 入库时间 2022-08-22 15:11:46

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