ELECTROLYTIC POLISHING LIQID OF CO-CR-TYPE ALLOY

摘要

PURPOSE:To obtain electrolytic polishing liquid which gives sufficiently bright surfaces and smooth surfaces by consisting the same essentially of ethylene glycol and adding and mixing a toluene sulfonic acid and a lower alkyl sulfonic acid to and with this. CONSTITUTION:Ethylene glycol is used as an essential component, to and with which a toluene sulfonic acid or its salt and lower alkyl sulfonic acid or its salt are added and mixed. Ortho-, mtha-, para-toluene sulfonic acids can be used as the toluene sulfonic acid and methane, ethane, propane sulfonic acids can be used for the lower alkyl sulfonic acid. Optimum compounding ratios are, for example, 30- 90vol% ethylene glycol 5-60vol% toluene sulfonic acid and 3-60vol% lower alkyl sulfonic acid. The Co-Cr type alloy electrolysis conditions by the polishing liquid are ordinry temp., about 3-10V voltages, about 3-10A/dm2 current densities and about 5-15min electrolysis time. This yields gloss of about 75-80% regular reflectivity.