Process for producing nucleate boiling centers on a surface of a silicon semiconductor substrate, cooling method using a surface produced by said process and apparatus for cooling a semiconductor device

摘要

1. A method of producing nucleate boiling sites on a surface of a silicon semiconductor body for cooling said body by means of a halogenated hydrocarbon cooling fluid, wherein by means of sandblasting the surface of a silicon substrate lattice defects and crystalline damage are made in said surface, characterized in that the lattice defects and crystalline damages are removed by selectively exposing this surface to a silicon etchant.