high speed screens positive photolackschichtaufbau from radiation degradable, adaptable, organic polymers and process for the production of a photolackmaske

摘要

A high sensitivity resist layer structure for high energy radiation exposure is formed by coating plural layers of radiation degradable polymers on a substrate which layers are successively slower dissolving in the resist developer. Upon exposure and solvent development, a resist edge profile is obtained which is particularly useful for metal lift-off.