首页> 外国专利> Integrated dual transistor SHF amplifier - has resistive or inductive input with symmetrical FET's capacitatively cross coupled between gate and drain operated in common source mode

Integrated dual transistor SHF amplifier - has resistive or inductive input with symmetrical FET's capacitatively cross coupled between gate and drain operated in common source mode

机译:集成双晶体管SHF放大器-具有电阻或电感输入,对称FET电容交叉耦合在以共源极模式工作的栅极和漏极之间

摘要

The high frequency amplifier (up to 10 GH3) consists of two gallium arsenide field effect transistors which are cross coupled by on chip capacitors between their gates and drains. The capacitors are produced using a chip area of similar dimensions to the transistors at these frequencies and the impedance may be set to be real or inductive at will. Inductive compensation is required for the capacitative output impedance but this is more easily provided at a power stage where dimensions are less crucial. The transistors are integrated in mirror symmetry with their sources common and gate to drain resistors are incorporated. Each drain metallisation partially covers the others gate metalisation with a spacing dielectric layer or vice versa. The amplifier is driven symmetrically with the input signal between the two gates and the output is taken between the two drains. The effect of the coupling capacitor on the output capacitance is to modify it by less than the mutual coupling capacitance. Each transistor operates in common source mode.
机译:高频放大器(高达10 GH3)由两个砷化镓场效应晶体管组成,它们通过片上电容器在其栅极和漏极之间交叉耦合。在这些频率下,使用与晶体管类似尺寸的芯片面积来生产电容器,并且可以随意设置阻抗为实数或感性。电容性输出阻抗需要电感补偿,但这在尺寸要求不高的功率级更容易提供。这些晶体管以镜像对称的方式集成在一起,它们的源极共用,并集成了栅极至漏极电阻。每个漏极金属化部分通过间隔介电层部分覆盖其他栅极金属化部分,反之亦然。放大器由两个栅极之间的输入信号对称驱动,而输出则在两个漏极之间获取。耦合电容器对输出电容的影响是要对其进行修改,使其小于互耦电容。每个晶体管均以共源极模式工作。

著录项

  • 公开/公告号FR2496357A1

    专利类型

  • 公开/公告日1982-06-18

    原文格式PDF

  • 申请/专利权人 THOMSON CSF;

    申请/专利号FR19800026545

  • 发明设计人 FELIX DIAMAND;

    申请日1980-12-15

  • 分类号H03F3/16;H03F3/189;

  • 国家 FR

  • 入库时间 2022-08-22 12:27:22

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