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Device for the electrostatic application of material particles entrained in a stream of gas to an advancing, flat substrate

机译:用于将夹带在气流中的材料颗粒静电施加到前进的平坦基材上的装置

摘要

A device for the electrostatic application of particles entrained in a stream of gas to a non-conductive, flat substrate, typically a web or sheets of paper. The particles are electrically neutral in the stream. A charging electrode is located below the substrate in the area where the gas stream impinges on the substrate. The substrate is advancing lengthwise, and a counterelectrode is located below the substrate in the direction of advance from the charging electrode. Preferably the direction and velocity of the gas stream near the substrate and direction and velocity of the substrate itself are approximately equal. Also in the preferred form, a grounded collecting pan is located beneath the electrodes.
机译:一种用于将夹带在气流中的颗粒静电施加到不导电的平坦基材上的设备,该基材通常为卷筒纸或纸页。粒子在流中是电中性的。充电电极在气流撞击到基板上的区域中位于基板下方。基板沿长度方向前进,并且反电极在从充电电极前进的方向上位于基板下方。优选地,靠近基底的气流的方向和速度以及基底本身的方向和速度近似相等。同样在优选形式中,接地收集盘位于电极下方。

著录项

  • 公开/公告号US4324198A

    专利类型

  • 公开/公告日1982-04-13

    原文格式PDF

  • 申请/专利权人 WEITMAN AND KONRAD GMBH & CO. KG;

    申请/专利号US19800179804

  • 发明设计人 EDWIN MUZ;

    申请日1980-08-20

  • 分类号B05B5/02;

  • 国家 US

  • 入库时间 2022-08-22 12:13:11

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