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Bath composition for electrodeposition of Bright deposit of tin and Cobalt alloys or Cobalt and Zinc electrodeposition process of these Alloys
Bath composition for electrodeposition of Bright deposit of tin and Cobalt alloys or Cobalt and Zinc electrodeposition process of these Alloys
Baths for electrodeposition of bright Co/Sn or Co/Zn alloys contain Co and Sn and/or Zn ions and a brightener of formula NR1R2R3 (I) (where R1 is 1-6C alkyl or hydroxyalkyl; R2 and R3 are H or 1-6C alkyl, hydroxyalkyl or aminoalkyl). (I) is pref. triethanolamine, N-(2-aminoethyl) ethanolamine, tris(hydroxymethyl aminomethane, triisopropylamine, monoethanolamine or N-methyldiethanolamine. Baths for Co/Sn deposition pref. contain 0.5-5 g/l Co ions, 0.5-5 g/l Sn ions, 1-20 ml/l (I) and 1-50 g/l gluconate or glucoheptonate. Baths for Co/Zn deposition pref. contain 0.5-10 g/l Co ions, 0.5-20 g/l Zn ions, 1-20 ml/l (I) and 1-100 g/l gluconate or glucoheptonate. The Sn ions are pref. stannous ions and the bath is pref. free of NH4 ions. The baths produce chrome-like deposits which can be rendered resistant to high-temp. discoloration and fingerprint retention by passivation with H3PO4/CrO3. -
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机译:用于电沉积光亮Co / Sn或Co / Zn合金的浴液包含Co和Sn和/或Zn离子和式NR1R2R3(I)的光亮剂(其中R1为1-6C烷基或羟烷基; R2和R3为H或1- 6C烷基,羟烷基或氨基烷基)。 (I)是首选。三乙醇胺,N-(2-氨基乙基)乙醇胺,三(羟甲基氨基甲烷,三异丙胺,单乙醇胺或N-甲基二乙醇胺。用于Co / Sn沉积的镀液优选包含0.5-5 g / l的Co离子,0.5-5 g / l的Sn离子,1-20 ml / l(I)和1-50 g / l葡萄糖酸或葡庚糖酸盐。用于Co / Zn沉积的镀液优选包含0.5-10 g / l的Co离子,0.5-20 g / l的Zn离子,1- 20 ml / l(I)和1-100 g / l葡萄糖酸或葡庚糖酸盐,Sn离子为亚锡离子,浴液中不含NH4离子,浴液中产生类似铬的沉积物,可抵抗H3PO4 / CrO3钝化可导致高温变色和保留指纹-
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