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Process for the surface-annealing of semi-conductor materials by pulsed microwave energy

机译:脉冲微波能量对半导体材料进行表面退火的方法

摘要

- list of semiconductor materials.;the annealing process of semiconductor material surface is characterized in that a sample of the semiconductor material in a resonant cavity.it is a pulse of microwave in the cavity and gives the pulse duration and the power sufficient to cause the annealing and / or melting of the sample and itssubsequent deformation.;application to the crystallization of a layer of an amorphous semiconductor material deposited on a substrate.
机译:半导体材料表面的退火工艺,其特征在于在谐振腔中的半导体材料的样品。它是腔中微波的脉冲,并给出脉冲持续时间和足以引起脉冲的功率。样品的退火和/或熔化及其随后的变形;应用于沉积在基板上的非晶半导体材料层的结晶。

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