Device for recrystallisation of thin surface films or thin films deposited on substrates, by means of an electron-emission system

摘要

The invention relates to a device for recrystallisation of thin surface films (2) or of thin films (2) which are deposited on substrates (1), by means of an electron-emission system, as is used, for example, in electron microscopes or electronic welding installations. In this case, the incandescent cathode (3) is constructed as a bar cathode and, for improved focusing, is surrounded by a Wehnelt electrode (4) which is formed in the shape of a symmetrical cylinder. The acceleration voltage is applied directly between the cathode (3) and the object (1, 2) which is to be recrystallised and which can move relative (see arrow 6) to the cathode (3). The device is used in the production of integrated semiconductor circuits and solar cells. IMAGE