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INFRARED ANTI-REFLECTION FILM OF GERMANIUM SUBSTRATE

机译:锗基质的红外抗反射膜

摘要

PURPOSE:To decrease the absorption of IR rays and to improve durability by providing prescribed films having prescribed refractive indices on the respective layers from the 1st to the 2nd layers. CONSTITUTION:A ZnS film having an intermediate refractive index is disposed on the 1st layer counted from the substrate side, Ge having a high refractive index on the 2nd layer, ZnS having said intermediate refractive index on the 3rd layer, LaF3, BaF2 or MgF2 having a low refractive index on the 4th layer and a ZnS film having said intermediate refractive index on the 5th layer, in the anti- reflection film of a germanium substrate. The respective thicknesses of the 1st layer - the 5th layer designated as d1, d2, d3, d4, d5 and the respective refractive indices designated as n1, n2, n3, n4, n5 are set at n1d1:n2d2: n3d3:n4d4:n5d5= 1:2:4.2:2.5:0.7. The IR anti-reflection film which provides a high effect of preventing reflection of IR rays, permits vapor deposition at a high speed and makes it easy to obtain the vapor-deposited film having high quality is thus obtd.
机译:目的:通过在第一层至第二层的各层上提供具有规定折射率的规定膜,以减少红外射线的吸收并提高耐用性。组成:具有中等折射率的ZnS膜设置在从基板侧开始计数的第一层上,第二层具有高折射率的Ge,第三层具有所述中间折射率的ZnS,具有第二层的LaF3,BaF2或MgF2在锗衬底的抗反射膜中,在第四层上具有低折射率,并且在第五层上具有具有所述中间折射率的ZnS膜。将第一层至第五层的各自的厚度指定为d1,d2,d3,d4,d5,并将各自的折射率设定为n1,n2,n3,n4,n5,将其设置为n1d1:n2d2:n3d3:n4d4:n5d5 = 1:2:4.2:2.5:0.7。因此,提供了一种IR防反射膜,该IR防反射膜具有防止IR射线反射的高效果,允许高速气相沉积并且易于获得高质量的气相沉积膜。

著录项

  • 公开/公告号JPS5917502A

    专利类型

  • 公开/公告日1984-01-28

    原文格式PDF

  • 申请/专利权人 TOUKIYOU KOUGAKU KIKAI KK;

    申请/专利号JP19820127403

  • 发明设计人 KUWABARA TETSUO;

    申请日1982-07-21

  • 分类号G02B1/10;

  • 国家 JP

  • 入库时间 2022-08-22 09:39:54

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