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NI-FE ALLOY SPUTTERING TARGET AND NI-FE ALLOY FILM

机译:NI-FE合金溅射靶材和NI-FE合金膜

摘要

PURPOSE:To obtain excellent magnetic characteristics by a method wherein the Fe weight ratio of the Ni-Fe alloy sputtering target, mainly consisting of Ni and Fe, is established as prescribed. CONSTITUTION:An Ni-Fe alloy film of 2mum in thickness is formed by performing a sputtering method. The absolute value of magnetic coercive force variries when the film thickness and the condition of formation of the alloy film change, but the tendency of the magnetic coercive force is unchanged, and an excellent magnetic characteristics are shown with a very narrow Fe component density range of 22-24wt%, thereby clearly differing from the characteristics developed outside the above-mentioned range. If a thin film head magnetic pole is formed with the Fe wt% within the above-mentioned range, a self recording picture output can be increased.
机译:目的:通过一种方法获得良好的磁性能,其中按规定确定了主要由Ni和Fe组成的Ni-Fe合金溅射靶的Fe重量比。组成:采用溅射法形成厚度为2μm的Ni-Fe合金膜。当膜厚和合金膜形成条件改变时,磁力矫顽力的绝对值会发生变化,但是磁力矫顽力的趋势不变,并且在极窄的Fe成分密度范围内表现出优异的磁特性。 22-24wt%,从而明显不同于上述范围之外产生的特性。如果以上述范围内的Fe重量%形成薄膜头磁极,则可以增加自记录图像的输出。

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