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NI-FE ALLOY SPUTTERING TARGET AND NI-FE ALLOY FILM
NI-FE ALLOY SPUTTERING TARGET AND NI-FE ALLOY FILM
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机译:NI-FE合金溅射靶材和NI-FE合金膜
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摘要
PURPOSE:To obtain excellent magnetic characteristics by a method wherein the Fe weight ratio of the Ni-Fe alloy sputtering target, mainly consisting of Ni and Fe, is established as prescribed. CONSTITUTION:An Ni-Fe alloy film of 2mum in thickness is formed by performing a sputtering method. The absolute value of magnetic coercive force variries when the film thickness and the condition of formation of the alloy film change, but the tendency of the magnetic coercive force is unchanged, and an excellent magnetic characteristics are shown with a very narrow Fe component density range of 22-24wt%, thereby clearly differing from the characteristics developed outside the above-mentioned range. If a thin film head magnetic pole is formed with the Fe wt% within the above-mentioned range, a self recording picture output can be increased.
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