Auger microlithography with regard to Auger window

摘要

An Auger microlithography process wherein a beam of substantially monochromatic X-rays is passed through a photomask to induce Auger electrons from a selected atomic element within a photosensitive layer which Auger electrons act on a material in that layer to cause a physicochemical change thereof and form a latent image. The X-rays used are selected to be substantially monochromatic such that the range of wave lengths falls largely or almost totally within the Auger window, as defined, determined by the particular electron shell of the atomic element to be activated to produce the Auger electrons.