EVALUATION SYSTEM OF CLEANLINESS OF DUSTPROOF OUTFIT AND CLEANLINESS EVALUATION JIG OF OUTFIT

摘要

PURPOSE:To count grains deposited on a substrate peeling from dustproof outfits and to facilitate control of dustproof outfits by placing a mirror-shaped substrate in the specific distance away from cloth in downstream of a gas cleaning cloth of dustproof outfits. CONSTITUTION:A close 3 of a dustproof outfit is held between a cylinder 1 with the specific inner diameter and a corresponding annular cover 2, and the specific quantity of cleaned gasses passing through a filter runs on the cloth. A mirror- shaped silicon wafer 5 is arranged in the specific distance away from the cloth of a jig, and is caused to receive the gass 6 passing through the cloth. A laser scattering-type surface detector counts grains which peel from a dustproof outfit 3 of the wafer 5 and deposite on the wafer 5. With a simple system, cleanliness of the cloth 3 of dustproof outfits can be evaluated quickly and precisely, control of dustproof outfits can be carried out efficiently and a yield and quality of products such as semiconductors and medicines can be enhanced.