RADIATION RESIST AND FORMATION OF RADIATION RESIST PATTERN

摘要

PURPOSE:A positive radiation resist having improved sensitivity, and resolution, easily handleable, comprising methyl methacrylate-methacrylic acid copolymer and a specific crosslinking agent. CONSTITUTION:A copolymer having a weight-average molecular weight of 10,000-200,000, obtained by copolymerizing methyl methacrylate with methacrylic acid at a molar ratio of 100:1-15, is incorporated with a crosslinking agent (C) of the formula (R is H or CH3; x is an integer 1-9; y and z are 0, 1, 2, or 3) at a ratio of the number of epoxy groups in (C) to that of carboxyl groups in the copolymer of 0.1-3.0 to give a radiation resist. The resist is then dissolved in a solvent and applied to a base board, heated at 100-170 deg.C, and crosslinked to form a resist film, which is exposed to radiation at a given area to form latent images of patterns. The images are then developed to give the positive images of the patterns.