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process for forming structures for the next sub micronico high resolution on a substrate.
process for forming structures for the next sub micronico high resolution on a substrate.
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机译:用于在衬底上形成用于下一个亚微电子高分辨率的结构的方法。
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摘要
A method for forming high resolution submicron structures on a substrate is provided by direct writing with a submicron electron beam in a partial pressure of a selected gas phase characterized by the ability to dissociate under the beam into a stable gaseous leaving group and a reactant fragment that combines with the substrate material under beam energy to form at least a surface compound. Variations of the method provide semiconductor device regions on doped silicon substrates, interconnect lines between active sites, three dimensional electronic chip structures, electron beam and optical read mass storage devices that may include color differentiated data areas, and resist areas for use with selective etching techniques.
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