首页> 外国专利> Process for inspecting and automatically classifying objects presenting configurations with dimensional tolerances and variable rejecting criteria depending on placement, apparatus and circuits therefor

Process for inspecting and automatically classifying objects presenting configurations with dimensional tolerances and variable rejecting criteria depending on placement, apparatus and circuits therefor

机译:检查并自动分类呈现具有尺寸公差和可变拒绝标准的配置的对象的过程,具体取决于其放置,设备和电路

摘要

1. A process for inspecting and automatically sorting objects showing patterns with dimensional tolerances and reject criteria varying in accordance with the location of said patterns, of the type including the comparison of the image of a reference object with the image of an object to be inspected, the latter being liable to show geometrical defects with respect to the reference object, characterized in that it includes the following steps : - Elaborating binary electronic images IREF and IEXA from the reference object and the object to be inspected, - Defining a structuring element B for each image point (pixel), the size of said structuring element being able to vary for each pixel in function of predetermined data and adjusting IREF to the maximum and minimum dimensional tolerances by expanding and eroding said image by means of structuring element B, which provides (IREF )max and (IREF )min , - Forming images of the "spreading" and "lack" type defects by respectively carrying out the following logical operations : [(IREF )max OR IEXA ] EXCL. OR (IREF )max and [(IREF )min OR IEXA ] EXCL. OR IEXA , - Measuring the size of the defects on the defect images and comparing said defects with respect to reject criteria which define, for each pixel, the dimensions of the defects which can be accepted according to predetermined data, and - Sorting and selecting objects without any defect or showing defects allowed by the reject criteria.
机译:1.一种检查和自动分类显示具有尺寸公差的图案并根据所述图案的位置而变化的拒绝标准的物体的方法,该类型包括将参考物体的图像与待检验物体的图像进行比较。 ,后者易于表现出相对于参考对象的几何缺陷,其特征在于,它包括以下步骤:-从参考对象和要检查的对象中制作二进制电子图像IREF和IEXA,-定义结构元素B对于每个图像点(像素),所述结构元件的尺寸能够根据预定数据而针对每个像素而变化,并且能够借助于结构元件B通过扩张和腐蚀所述图像来将IREF调整为最大和最小尺寸公差,其中提供(IREF)max和(IREF)min-通过分别执行“形成”和“缺失”类型缺陷的图像以下逻辑运算:[(IREF)max或IEXA] EXCL。 OR(IREF)max和[(IREF)min OR IEXA] EXCL。或IEXA,-测量缺陷图像上缺陷的大小,并根据拒绝标准比较所述缺陷,该拒绝标准为每个像素定义可以根据预定数据接受的缺陷的尺寸,并且-排序和选择对象没有任何缺陷或显示拒绝标准所允许的缺陷。

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