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Electron-optical system with variable-shaped beam for generating and measuring microstructures
Electron-optical system with variable-shaped beam for generating and measuring microstructures
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机译:带有可变形状光束的电子光学系统,用于产生和测量微结构
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摘要
An electron-optical system with a variable-shaped beam for generating and measuring microstructures, such as circuits on a semiconductor substrate, generates the variable-shaped electron beam by the use of electron-optical shadow projection imaging and has a remote focus multipole Wehnelt electrode for adjusting, focusing, and controlling the intensity of the electron beam. The system also has a ferrite polecylinder in the beam projections lens with field attenuation or may have a beam projection lens with an external air gap. The length of the electron beam is approximately 60 centimeters.
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