首页> 外国专利> Scattering apodizer for laser beams

Scattering apodizer for laser beams

机译:激光束散射切趾器

摘要

A method is disclosed for apodizing a laser beam to smooth out the production of diffraction peaks due to optical discontinuities in the path of the laser beam, such method comprising introduction of a pattern of scattering elements for reducing the peak intensity in the region of such optical discontinuities, such pattern having smoothly tapering boundaries in which the distribution density of the scattering elements is tapered gradually to produce small gradients in the distribution density, such pattern of scattering elements being effective to reduce and smooth out the diffraction effects which would otherwise be produced. The apodizer pattern may be produced by selectively blasting a surface of a transparent member with fine abrasive particles to produce a multitude of minute pits. In one embodiment, a scattering apodizer pattern is employed to overcome diffraction patterns in a multiple element crystal array for harmonic conversion of a laser beam. The interstices and the supporting grid between the crystal elements are obscured by the gradually tapered apodizer pattern of scattering elements.
机译:公开了一种用于变迹激光束以平滑由于激光束的路径中的光学不连续而导致的衍射峰的产生的方法,该方法包括引入散射元件的图案以减小这种光学区域中的峰强度。不连续性,这种图案具有平滑变细的边界,其中散射元件的分布密度逐渐变细以在分布密度中产生小的梯度,这种散射元件的图案有效地减少和消除了否则会产生的衍射效应。可以通过用细磨料颗粒选择性地喷砂透明构件的表面以产生大量的微坑来产生切趾图案。在一个实施例中,采用散射切趾器图案来克服多元素晶体阵列中的衍射图案,以实现激光束的谐波转换。晶体元件之间的间隙和支撑网格被散射元件逐渐变细的切趾图案所掩盖。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号