METHOD FOR PRODUCING A PRESENT RADIATION WINDOW FLUID ON AN SI (LI) DRIFT DETECTOR

摘要

Claim 1: A method for producing a predetermined surface of the radiation entrance window on a Si (Li) -Driftdetektor, characterized in that provided by the drift process, the entire intended for the generation of the beam entrance window surface of the silicon body (1) with a partially injecting, partly p-type Contact layer is provided and in the subsequent further processing of the drift detector, the injecting contact layer at least in the vicinity of the beam entrance window, for example is removed by lapping or etching. Fig.1-3