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Scanning electron-beam exposure system

机译:扫描电子束曝光系统

摘要

In a scanning electron-beam exposure system for exposing a desired rectangular area which is larger than a predetermined maximum rectangle, the desired rectangular area is divided into a plurality of areas. Two sets of such divided areas are shifted two-dimensionally from each other. The one set of divided areas are exposed with half of a predetermined electron-beam dose and the other set of divided areas are also exposed with half of the predetermined dose. This serves to reduce undesirable effects at boundaries between scanned areas.
机译:在用于曝光大于预定最大矩形的期望矩形区域的扫描电子束曝光系统中,期望矩形区域被划分为多个区域。两组这样的划分区域彼此二维地移位。一组划分区域以预定电子束剂量的一半曝光,而另一组划分区域也以预定剂量的一半曝光。这用于减少在扫描区域之间的边界处的不良影响。

著录项

  • 公开/公告号EP0098177A3

    专利类型

  • 公开/公告日1986-06-04

    原文格式PDF

  • 申请/专利权人 FUJITSU LIMITED;

    申请/专利号EP19830303812

  • 申请日1983-06-30

  • 分类号H01J37/302;H01J37/317;

  • 国家 EP

  • 入库时间 2022-08-22 07:35:59

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