device for the examination of a subject and pattern for errors

摘要

Herein disclosed is a pattern defect inspecting method which is characterized: in that an image is picked up from an article having a preset pattern thereby to extract the data of the pattern to be inspected while shifting the article with respect to the standard position preset in a picking-up picture image; in that a parameter indicating the defective degree of the pattern to be inspected is determined on the basis of the aforementioned data extracted and the dictionary data stored in advance; in that the parameter indicating the minimum defective degree is extracted from among those determined for such plural patterns to be inspected as are extracted from the vicinity of the standard position; and in that the parameter extracted is compared with a preset threshold value thereby to determine the propriety of the pattern.