ULTRAFINE PATTERN WORKING CARBON FILM AND WORKING METHOD FOR ULTRAFINE PATTERN

摘要

PURPOSE:To work an ultrafine pattern of approx. 0.1mum by using a carbon film which contains 5-20% of hydrogen content as a thin lower layer film. CONSTITUTION:A substrate 2 for forming a carbon film is placed on a holder 7 in a vacuum bell-jar 1, and the bell-jar 1 is evacuated. Then a flow rate regulating valve 11 is opened, Ar gas is introduced through an introducing tube 9 to the bell-jar 1, a microwave is oscillated by a microwave oscillator 4, Ar gas plasma is generated in the bell-jar 1, and the surface of the substrate 2 is cleaned. After the cleaning is finished, a flow rate regulating valve 12 is opened, C2H2 gas is introduced through an introducing tube 10 into the bell-jar 1, and C2H2 plasma by a microwave is generated. At this time, a shutter 8 is opened to form a carbon film which contains 5-20% of hydrogen content on the substrate 2. Thus, an ultrafine pattern can be worked.