首页> 外国专利> DEVELOPING SOLUTION WHICH CAN MAKE COMMON PROCESSING OF NEGATIVE TYPE AND POSITIVE TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND DEVELOPING PROCESS METHOD USING SAID SOLUTION

DEVELOPING SOLUTION WHICH CAN MAKE COMMON PROCESSING OF NEGATIVE TYPE AND POSITIVE TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND DEVELOPING PROCESS METHOD USING SAID SOLUTION

机译:可以对负型和正型光敏石版印刷板进行共同处理的解决方案以及使用所述解决方案的开发方法

摘要

PURPOSE:To form a developing soln. which can make common developing process of a negative type PS plate and positive type PS plate by using an aq. alkaline soln. contg. an alkali metal silicate and amphoteric surface active agent or anionic surface active agent as the essential component for the developing soln. and preparing said soln. so as not to contain an org. solvent. CONSTITUTION:This developing soln. consists essentially of the aq. alkaline soln. contg. 1-10wt% alkali metal silicate expressed by the formula xSiO2.yM2O (M is an alkali metal, x, y respectively denote molar number of SiO2 and M2O, x/y are 0.8-2.0) and 0.01-5wt% amphoteric surface active agent or anionic surface active agent and having =11.5pH and contains substantially no org. solvent. The development is defective if the content of the alkali metal silicate is 1% and the development is defective or excessive according to the kind of the PS plate if the content thereof exceeds 10%. The excessive development or the dissolution of the image is caused if the value of x/y is 0.8 and the development is defective if the value exceeds 2.0. The development is defective if the pH of the developing soln. is 1.5.
机译:目的:形成显影液。通过使用aq水溶液可以使负型PS板和正型PS板共同显影。碱性溶液。续碱金属硅酸盐和两性表面活性剂或阴离子表面活性剂作为显影液的基本成分。并准备所说的溶液。以免包含组织。溶剂。宪法:这种正在发展的解决方案。基本上由水溶液组成。碱性溶液。续由式xSiO2.yM2O表示的1-10wt%碱金属硅酸盐(M为碱金属,x,y分别表示SiO2和M2O的摩尔数,x / y为0.8-2.0)和0.01-5wt%的两性表面活性剂阴离子表面活性剂或阴离子表面活性剂,pH值大于等于11.5,基本上不含org。溶剂。如果碱金属硅酸盐的含量<1%,则显影不良,如果超过10%,则根据PS板的种类,显影不良或过多。如果x / y的值<0.8,则会导致图像过度显影或溶解,而如果x / y的值超过2.0,则显影不良。如果显影液的pH值,则显影不良。 <1.5。

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