Ion beam Sputter-etched ventricular catheter for hydrocephalus shunt

摘要

This invention is directed to an improved cerebrospinal fluid shunt in the form of a ventricular catheter for controlling the condition of hydrocephalus by relieving the excessive cerebrospinal fluid pressure. The invention is further concerned with an improved method for fabricating the catheter and an improved method of shunting the cerebral fluid from the cerebral ventricles to other areas of the body.;The obstruction of cerebrospinal fluid flow pathways or its inadequate absorption via the arachnoid villi into the venus blood of the brain results in hydrocephalus. Surgical correction involves pressure controlled shunting of the cerebrospinal fluid. The shunt will fail to function if the inlet ventricular catheter apertures become blocked. Shunt flow failure will also occur if the ventricle collapses due to improper valve function causing over drainage.;The ventricular catheter 10 of the present invention comprises a multiplicity of inlet microtubules 12. Each microtubule has both a large opening 16 at its inlet end and a multiplicity of microscopic openings 18 along its lateral surfaces.;The microtubules are perforated by a new and novel ion beam sputter etch technique. The holes are etched in each microtubule by directing an ion beam 20 through an electro formed metal mesh mask 28 producing perforations having diameters ranging from about 14 microns to about 150 microns.;This combination of a multiplicity of fluoropolymer microtubes, the numerous small holes provided in the lateral surfaces of the tubes, and the hydra-like distribution of the tubes provide a new and novel catheter. This structure assures a reliable means for shunting cerebrospinal fluid from the cerebral ventricles to selected areas of the body.