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DEVICE FOR MEASURING THE ORIENTATION OF MONOCRYSTALLINE MASSIVE MATERIALS BY THE LAUNE METHOD

机译:用劳恩法测定单晶大块材料取向的装置

摘要

P DEVICE FOR MEASURING THE ORIENTATION OF MONOCRYSTALLINE MASSIVE MATERIALS BY THE METHOD OF THE LAUNCHER CHAMBER COMPRISING SUPPORT MEANS FOR A MASSIVE SAMPLE AND ALIGNMENT MEANS FOR THE LAUNCHER CHAMBER AND THE SUPPORT MEANS, CHARACTERIZED IN THAT THE MEANS OF SUPPORT INCLUDE A SAMPLE HOLDER 10 WHICH PRESENTS A FIRST FACE PLANE 1 TO RECEIVE THE SAMPLE, A SECOND FACE PLANE 2 PERPENDICULAR TO THE FIRST TO BLOCK THE SAMPLE, A FIRST 11 AND A SECOND 12 PLANS OF REFERENCE RESPECTIVELY PARALLEL TO FIRST 1 AND SECOND 2 FACES PLANES, AND THIRD REFERENCE PLAN 13 PERPENDICULAR TO BOTH FIRST 1 AND SECOND 2 FACES PLANES, IN THAT THE MEANS OF ALIGNMENT CONSIST IN A BENCH OPTICAL B HAVING AT LEAST TWO REFERENCE PLANS 21, 22 PARALLEL TO THE OPTICAL AXIS OF THE LAUNCHER CHAMBER, WHICH SUPPORT DURING THE MEASUREMENT BE THE FIRST 11 AND THE SECOND 12, BE THE FIRST 11 AND THE THIRD 13 SAMPLE HOLDER REFERENCE PLANS 10. / P P APPLICATION: MEASUREMENT OF SINGLE CRYSTALS ORIENTATION FOR THE MANUFACTURE OF INTEGRATED CIRCUIT SUBSTRATES. / P
机译:

一种通过发射器腔室的方法来测量单晶大材料取向的装置,该发射器腔室包括大量样品的支持装置和发射腔室的对准装置,以及支持的装置,其特征在于其中所含的十项呈现第一个平面1以便接收样品,第二个平面2垂直于第一个阻止样品,第11个和第12个参考计划分别与第一个1和第二个2平面平行,以及第三个参考计划13垂直于第一平面和第二平面,这是因为在同一光学B中,对准的手段至少有两个参考计划21、22相对于发射腔的光学轴(在测量中得到支持)第一个11和第二个12,是第一个11和第三个13样本持有人参考计划10。

应用程序:测量制造商的单晶取向集成电路基板的E。

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