Apparatus for distributing the head load to the first wall from the plasma in an OTHE-type high-energy plasma device

摘要

Apparatus for containing plasma in a high energy plasma device includes a vacuum tight liner wall made up, at least in part, by a series of sections each having a closed peripheral wall defining an interior with open ends. Adjacent sections form a plasma path with each section having an inside surface and an outside surface with the interior of the section being generally circular in cross section. A magnet system is provided which includes first conductors positioned outside the section for generating a magnetic field extending inside the section. An armature ring is positioned inside the section with the ring having rollers for engaging the inside surface of the section. The ring also includes current carrying armature conductors extending at an angle to the lines of force of the magnetic field. Armor tiles are carried by the ring facing the plasma path for acting as plasma limiters so that the interaction of magnetic field and the current in the armature conductors causes rotation of the armature ring to prevent damage to the liner wall due to localized heating. A method for protecting a vacuum tight liner wall in a high energy device is also disclosed.