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Forming monolithic planar opto-isolators by selective implantation and proton bombardment
Forming monolithic planar opto-isolators by selective implantation and proton bombardment
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机译:通过选择性注入和质子轰击形成单片平面光隔离器
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摘要
Disclosed are novel opto-isolator devices and processes for fabricating same wherein suitable semiconductive substrates, such as galium arsenide wafers, are treated with conductivity type determining impurities in such a manner as to form radiation emitters, radiation detectors and interconnecting waveguides therein. These operative regions which form a monolithic opto-isolator have the necessary electro-optical characteristics for generating and coupling radiation from the emitter and through the waveguide coupler to the detector; and all of these regions may be integrally fabricated in a monolithic batch fabrication process. Such process may use, for example, particle implantation and masking steps, thereby ensuring high yield and low cost device fabrication.
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