REPAIRING METHOD FOR CORRECTED FLAW IN PATTERN EXPOSING METHOD

摘要

PURPOSE:To easily prevent a pattern image line due to a correct flaw from becoming thick by applying and curing quick-setting transparent resin which has a specific refractive index on the surface of a photomask where the corrected flaw exits. CONSTITUTION:The quick-setting transparent resin (d) (e.g. watersoluble acrylic resin) which has the refractive index close to that of the base film a' of the photomask and does not damage emulsion c' is applied to a pattern corrected flow part b' and a uniform and smooth thin film is formed on the entire photomask emulsion surface. Light projected on the corrected flaw part b' is hardly scattered, so the pattern image line due the corrected flaw b' is prevented from becoming thick.