Method for producing ultralow-mass fissionable deposits for reactor neutron dosimetry by recoil ion-implantation

摘要

An alpha recoil ion-implantation method uses an alpha-emitting source that is a radioactive parent of the daughter isotope of interest to implant into a suitable substrate the recoil daughter ions resulting from alpha decay of the parent. For example, a ²⁴¹Am source in thin layer form is placed next to a substrate such as a solid state track recorder in a vacuum which houses an assembly for rotating opposing disks receiving the alpha-emitting source and the substrate, respectively. Each alpha decay of ²⁴¹Am results in a ²³⁷Np ion with enough recoil energy to be implanted into the substrate.