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Process of depositing diamond-like thin film by cathode sputtering
Process of depositing diamond-like thin film by cathode sputtering
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机译:阴极溅射沉积类金刚石薄膜的工艺
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摘要
The present invention relates to a diamond-like thin film and a method of making the diamond-like thin film comprises causing sputtering by applying an electric power under a limited hydrogen pressure within a sputtering apparatus having a graphite target and forming on a substrate the diamond-like thin film composed an accumulation of particles of several nm to several 100 nm and having its surface enclosed with alkyl radicals whose carbon number is 3 or less and its interior provided with a diamond structure of a four coordinated carbon arrangement.
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