首页> 外国专利> METHOD AND APPARATUS FOR MICROSCOPIC EVALUATION OF SUPERCONDUCTIVITY

METHOD AND APPARATUS FOR MICROSCOPIC EVALUATION OF SUPERCONDUCTIVITY

机译:显微评估超导性的方法和装置

摘要

PURPOSE:To easily measure the superconductive region in a specimen, by scanning the surface of the specimen while applying constant force to a vertical magnetically charged probe and measuring the force received by the probe or the displacement of said probe in relation to a position. CONSTITUTION:A specimen 1 is set to a horizontal specimen stand 2 and the L-shape probe 3 opposed to the specimen 1 is supported at the fulcrum 4 of a horizontal part. Magnetism is imparted to the probe 3 by an electromagnetic coil 5 so as not to break the superconductive critical magnetic field of the specimen 1. Then, the probe 3 and the specimen stand 2 are relatively moved to act upward force on the probe 3 in the superconductive region of the specimen 1 and said force is measured by the displacement measuring device 7 provided to the horizontal part of the probe 3 and the displacement measured value is displayed on a recorder 8 in relation to a measuring position. Therefore, the two-dimensional distribution of the superconductive region in the specimen can be easily measured.
机译:用途:为了轻松地测量样品中的超导区域,可在对垂直带电探针施加恒定力的同时扫描样品表面,并测量探针承受的力或所述探针相对于位置的位移。构成:将样品1放置在水平样品架2上,与样品1相对的L形探头3支撑在水平部分的支点4上。电磁线圈5将磁场施加给探头3,以免破坏样品1的超导临界磁场。然后,探头3和样品台2相对移动,以在探头3中向探头3施加向上的力。通过设置在探头3的水平部分上的位移测量装置7来测量样品1的超导区域和所述力,并且将位移测量值相对于测量位置显示在记录器8上。因此,可以容易地测量试样中的超导区域的二维分布。

著录项

  • 公开/公告号JPH01123142A

    专利类型

  • 公开/公告日1989-05-16

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC IND LTD;

    申请/专利号JP19870281092

  • 发明设计人 UEDA TOSHIO;SHIRAKAWA FUTATSU;

    申请日1987-11-09

  • 分类号G01N27/72;G01N37/00;G01Q60/00;G01Q60/54;G01R33/035;G01R33/10;

  • 国家 JP

  • 入库时间 2022-08-22 06:48:12

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号