PURPOSE:To obtain an ordinary-pressure CVD device capable of automatically replacing a susceptor in a short time by providing the susceptor freely detachably placed on a heater, housing parts for the susceptors before and after use thereof and a susceptor replacing means between the housing parts and the heater. CONSTITUTION:A material 21 to be treated is set on a susceptor 20 placed on a heater 22 and heated, and reactive gas is blown along the surface while relatively moving it between gas feed heads 40 and a CVD thin film is formed on the surface of the material 21. At this time, the CVD thin film is built-up even on the surface of the susceptor 20 of the part uncovered with the material 21. When this build-up amount has been increased by CVD of several times, the used susceptor 20 on the heater 20 is taken out and housed in a susceptor containing part 80 or 81 with a susceptor replacing means 70 by utilizing a time for replacing the cassettes 60, 61 containing the material 21. The unused susceptor 20 housed in either of the housing parts 80, 81 is set on the heater 22 and CVD thin film forming operation is similarly performed.
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