LIGHT SHIELDABLE FILM-DEPOSITED SUBSTRATE AND SUBSTRATE WITH LIGHT SHIELDING PATTERN

摘要

PURPOSE:To obtain a substrate with light shielding patterns having fine patterns only by the exposing and developing stages by forming the light shieldable film of a light shieldable film-deposited substrate of a pigment-dispersed photosensitive resin. CONSTITUTION:A photosetting type acrylic resin dispersed with about 20wt.% carbon black as a pigment is coated by a spin coating method on one main surface of a light transparent substrate 1 and is prebaked; thereafter, the light shieldable film 2 consisting of the pigment-dispersed photosetting type resin is deposited on one main surface of the light transparent substrate 1, by which a photomask blank A is obtd. This light shieldable film 2 and a master mask 3 are then brought into tight contact with each other and are exposed with UV rays 4, following which the photomask blank A is detached from the master mask 3 and is developed to remove the non-exposed part. The mask is then subjected to scrub cleaning. This mask is post-baked to obtain the photomask B having the light shieldable film pattern 2a on the light transparent substrate 1. The substrate with the light shielding pattern having the high resolution is thus obtd. only by exposing and developing.