POSITIVE TYPE RADIOSENSITIVE MIXTURE AND POSITIVE TYPE RADIOSENSITIVE RECORDING MATERIAL AND MANUFACTURE OF SAID RECORDING MATERIAL

摘要

PURPOSE: To adapt the compound to the pattern resolution of a developed resist by using a compound capable of dissociating by an acid as a monomer and a giving a specific acetal group. CONSTITUTION: The compound capable of dissociating by the acid is the monomer, has the specific acetal group, an aldehyde component or keton component of the acetal group is selected so as to have the developer solubility of 1-100g/l and higher b.p. than 150 deg.C, and the compound producing the acid by the action of the chemical ray and the compound capable of dissociating by the acid are incorporated. The specific adaptability of the monomer acetal to be used is applied even in the case that a high molecular weight initiator is changed in accordance with a monomer material. As a result, improved processing allowance is attained and the requirement for the high pattern resolution of the developed resist is satisfied.