首页> 外国专利> SEMI-INSULATING GALLIUM ARSENIDE SINGLE CRYSTAL HAVING LOW DISLOCATION DENSITY

SEMI-INSULATING GALLIUM ARSENIDE SINGLE CRYSTAL HAVING LOW DISLOCATION DENSITY

机译:半绝缘砷化镓单晶具有低位错密度

摘要

PURPOSE:To obtain the above single crystal having decreased dislocation density by impurity hardening effect, by adding Cr and Al in the production of a GaAs single crystal by a boat method or a liquid encapsulated pulling-up method. CONSTITUTION:A GaAs single crystal is produced by a boat method or a liquid encapsu lated pulling-up method. In the case of, e.g., a boat method, a quartz boat containing a seed crystal and a raw material Ga together with Cr and 1017-1020cm-3 of Al is placed at one end of a reaction tube made of a quartz glass. After placing As at the other end, the reaction tube is sealed. The tube is inserted into e.g. a tandem electric furnace, etc., and the temperature of the tube is maintained to =1,200 deg.C at the boat-side and to about 600 deg.C at the As-side. After the completion of the GaAs synthesis reaction, the boat-side temperature is further raised while keeping the As-side temperature unchanged and the temperature in the furnace is controlled in such a manner as to keep the seeding part at the melting point of GaAs (1,238 deg.C) and increase the temperature toward the side of the boat main body at a temperature gradient of about 1 deg.C/cm. After melting a part of the seed crystal, the reaction tube is cooled at a rate of 1 deg.C/hr while keeping the above temperature gradient until the whole molten liquid is solidified to obtain the above single crystal.
机译:用途:为了通过杂质硬化作用获得具有降低的位错密度的上述单晶,在通过舟法或液体封装提拉法生产GaAs单晶中添加Cr和Al。组成:GaAs单晶是通过舟法或液体封装上拉法生产的。在例如舟皿法的情况下,将包含晶种和原料Ga以及Cr和10 17 -10 20 cm -3的Al的石英舟皿放置在晶舟的一端。反应管由石英玻璃制成。在另一端放置As之后,将反应管密封。将管插入例如在串联的电炉等中,管的温度在船侧保持在> = 1,200℃,在As侧保持在大约600℃。 GaAs合成反应完成后,在保持As侧温度不变的情况下,进一步提高舟侧温度,并以使晶种部分保持在GaAs熔点以下的方式控制炉内温度( 1,238℃),并以约1℃/ cm的温度梯度向船主体的侧面提高温度。在部分晶种熔化之后,将反应管以1℃/小时的速率冷却,同时保持上述温度梯度,直到全部熔融液体固化以获得上述单晶。

著录项

  • 公开/公告号JPH01201100A

    专利类型

  • 公开/公告日1989-08-14

    原文格式PDF

  • 申请/专利权人 HITACHI CABLE LTD;

    申请/专利号JP19880026289

  • 发明设计人 MIZUNIWA SEIJI;KURIHARA TORU;HATTORI AKIO;

    申请日1988-02-05

  • 分类号H01L21/208;C30B11/00;C30B27/02;C30B29/42;

  • 国家 JP

  • 入库时间 2022-08-22 06:46:42

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号