首页> 外国专利> HIGH LUMINANCE ARC DISCHARGE LIGHT SOURCE UTILIZING MAGNETIC FIELD OR ELECTRIC FIELD FOR ARC POSITION CONTROL

HIGH LUMINANCE ARC DISCHARGE LIGHT SOURCE UTILIZING MAGNETIC FIELD OR ELECTRIC FIELD FOR ARC POSITION CONTROL

机译:利用磁场或电场控制电弧的高亮度电弧放电光源

摘要

PURPOSE: To permit a high luminance arc discharge by controlling the offset of an arc by the action of a magnetic field to be controlled, which is generated in an arc region so as to offset a portion of the arc. CONSTITUTION: An electromagnetic field B having a component perpendicular to an arc 14 is generated in a region of the arc 14, and the magnetic field B for offsetting a portion of the arc 14 is controlled to adjust the offset of the arc 14. When an arc lamp 20 is employed in an optical system, the offset of the arc 14 can be utilized to regulate a light beam direction, a light beam focus or a light beam intensity. Moreover, the arc lamp 20 can be activated by using a DC power source or an AC power source having a prescribed frequency, thus making possible a high intensity arc discharge.
机译:目的:通过在磁场区域内产生的电弧来控制电弧的偏移,从而补偿电弧的一部分,从而允许高亮度电弧放电。构成:在电弧14的区域中会产生具有垂直于电弧14的分量的电磁场B,并且控制用于补偿电弧14的一部分的磁场B来调整电弧14的偏移。弧光灯20用于光学系统中,弧光14的偏移量可用于调节光束方向,光束聚焦或光束强度。而且,可以通过使用具有规定频率的直流电源或交流电源来启动弧光灯20,从而可以进行高强度的电弧放电。

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