PURPOSE:To optionally set a current density on the surface of at least one of the little parallel-plate discharge electrode or a space apart from the surface by providing a specified recess on the surface. CONSTITUTION:In the circular electrode of the parallel-plate discharge electrode for a plasma etching device, many holes having about 7mm diameter and about 15mm depth are bored through the electrode, and the number of the holes is progressively increased from the inside toward the outer periphery of the disk. A hollow cathode discharge is generated in the hole, and the discharge current density is increased. Accordingly, the discharge current density on the electrode surface is progressively lowered from the outer periphery toward the center part. In addition, the current density distribution in the space apart from the electrode is controlled by the current density distribution set on the electrode surface. As a result, an etching can be contrived with excellent uniformity in the plane.
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