POSITIVE PHOTORESIST DEVELOPER CONTAINING DEVELOPMENT MODIFIERS

摘要

ABSTRACT OF THE DISCLOSUREA developer for positive photoresists which canimprove the sensitivity and resolution of the resist isdisclosed. The developer comprises an aqueous solution ofa quaternary ammonium hydroxide represented by the formula (I)wherein R1, R2, R3, and R4 are each an alkyl group having1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5carbon atoms, and at least one development modifierselected from the group consisting of water-solublealiphatic ketones, cyclic ethers, and tertiary amines,and optionally, at least one another development modifierselected from the group consisting of water-solubleprimary amines and secondary amines.