首页> 外国专利> MANUFACTURE OF THIN MOLYBDENUM SULFIDE FILM, MANUFACTURE OF MOLYBDENUM SULFIDE FILM AND SELF-LUBRICATING LAYER, ELECTRO-OPTICAL LAYER, AND CATALYTICALLY ACTING LAYER

MANUFACTURE OF THIN MOLYBDENUM SULFIDE FILM, MANUFACTURE OF MOLYBDENUM SULFIDE FILM AND SELF-LUBRICATING LAYER, ELECTRO-OPTICAL LAYER, AND CATALYTICALLY ACTING LAYER

机译:薄硫化钼膜的制造,硫化钼膜和自润滑层的制造,光电层和催化活性层

摘要

PURPOSE: To form an MoS film having an excellent characteristic as the self- lubricating layer, electrochemical layer and chemical catalytic layer on the surface of the insulating substrate and conductive substrate by allowing molybdenum hexacarbonyl to react with H2S in plasma. ;CONSTITUTION: The surface of the substrate consisting of various polymers, plastics, ceramics or metals is previously etched and purified, and then the substrate is put in a reaction vessel. The vessel is evacuated, and then gaseous H2S as the reactive gas of a volatile sulfur compd. is introduced into the vessel with gaseous Ar or gaseous H2 as a carrier gas. A high voltage is impressed on the electrode in the vessel to generate a glow discharge, plasma is produced in the presence of the gaseous H2S, the Mo compd. is allowed to react with the H2S, and a high-purity MoS2 film capable of being utilized in various uses is formed on the substrate surface.;COPYRIGHT: (C)1990,JPO
机译:目的:通过使六羰基钼与H 2 反应,在绝缘基板和导电基板的表面上形成具有优异性能的自润滑层,电化学层和化学催化层的MoS膜。血浆中的S。 ;组成:由各种聚合物,塑料,陶瓷或金属组成的基板表面事先经过蚀刻和纯化,然后将基板放入反应容器中。将该容器抽真空,然后将气态H 2 S作为挥发性硫的反应气体进行浓缩。用气态氩气或气态H 2 作为载气引入容器。钼在容器中的电极上施加高电压以产生辉光放电,在气态H 2 S存在下产生等离子体。使之与H 2 S反应,并在基板表面形成能够用于多种用途的高纯度MoS 2 膜。 1990年,日本特许厅

著录项

  • 公开/公告号JPH02213474A

    专利类型

  • 公开/公告日1990-08-24

    原文格式PDF

  • 申请/专利权人 SCHERING AG;

    申请/专利号JP19890260325

  • 申请日1989-10-06

  • 分类号C01G39/06;B01J27/051;C23C16/30;

  • 国家 JP

  • 入库时间 2022-08-22 06:23:55

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